Name |
Symbol |
Germanium |
Silicon |
Gallium Arsenide |
Bandgap energy at 300 K |
Eg (eV) |
0.66 |
1.12 |
1.424 |
Breakdown Field |
Ebr (V/cm) |
105 |
3 x 105 * |
4 x 105 |
Density |
(g/cm3) |
5.33 |
2.33 |
5.32 |
Effective density of states in the conduction band at 300 K |
Nc (cm-3) |
1.02 x 1019 |
2.82 x 1019 |
4.35 x 1017 |
Effective density of states in the valence band at 300 K |
Nv (cm-3) |
5.65 x 1018 |
1.83 x 1019 |
7.57 x 1018 |
Intrinsic concentration at 300 K |
ni (cm-3) |
2.8 x 1013 |
1.0 x 1010 |
2.0 x 106 |
Effective mass for density of states calculations |
|
|
|
|
Electrons |
me* / m0 |
0.55 |
1.08 |
0.067 |
Holes |
mh* / m0 |
0.37 |
0.81 |
0.45 |
Electron affinity |
χ (V) |
4.0 |
4.05 |
4.07 |
Lattice constant |
a (pm) |
564.613 |
543.095 |
565.33 |
Mobility at 300 K (undoped) |
|
|
|
|
Electrons |
μn (cm2/V-s) |
3900 |
1400† |
8800 |
Holes |
μp (cm2/V-s) |
1900 |
450† |
400 |
Relative dielectric constant |
εs/ ε0 |
16 |
11.9 |
13.1 |
Thermal conductivity at 300 K |
κ (W/cmK) |
0.6 |
1.5 |
0.46 |
Refractive index at 632.8 nm wavelength |
n |
5.441 - i 0.785 |
3.875 - i 0.0181 |
3.856 - i 0.196 |
*
See also section 4.5.1: Breakdown field in silicon at 300 K†
See also section 2.7.2: Mobility of doped silicon at 300 K