
|
Symbol |
Description |
MKS Units |
|
|
a |
Acceleration |
m/s2 |
|
|
Bohr radius |
m |
||
|
A |
Area |
m2 |
|
|
A* |
Richardson constant |
m/s |
|
|
AC |
Collector area |
m2 |
|
|
AE |
Emitter area |
m2 |
|
|
b |
Bimolecular recombination constant |
m3/s |
|
|
c |
Speed of light in vacuum |
m/s |
|
|
C |
Capacitance per unit area |
F/m2 |
|
|
CD |
Diffusion capacitance per unit area |
F/m2 |
|
|
CDS |
Drain-source capacitance |
F |
|
|
CFB |
Flatband capacitance per unit area of a MOS structure |
F/m2 |
|
|
CG |
Gate capacitance |
F |
|
|
CGS |
Gate-source capacitance |
F |
|
|
CGD |
Gate-drain capacitance |
F |
|
|
CHF |
High-frequency capacitance per unit area of a MOS structure |
F/m2 |
|
|
Cj |
Junction capacitance per unit area |
F/m2 |
|
|
CLF |
Low-frequency (quasi-static) capacitance per unit area of a MOS structure |
F/m2 |
|
|
CM |
Miller capacitance |
F |
|
|
Cox |
Oxide capacitance per unit area |
F/m2 |
|
|
Cs |
Semiconductor capacitance per unit area |
F/m2 |
|
|
Dn |
Electron diffusion constant |
m2/s |
|
|
Dp |
Hole diffusion constant |
m2/s |
|
|
E |
Energy |
Joule |
|
|
E |
Electric field |
V/m |
|
|
E0 |
Lowest energy in a one-dimensional quantum well |
Joule |
|
|
Ea |
Acceptor energy |
Joule |
|
|
E br |
Breakdown field |
V/m |
|
|
Ec |
Conduction band energy of a semiconductor |
Joule |
|
|
Ed |
Donor energy |
Joule |
|
|
EF |
Fermi energy (thermal equilibrium) |
Joule |
|
|
EF,n |
Fermi energy in an n-type semiconductor |
Joule |
|
|
EF,p |
Fermi energy in a p-type semiconductor |
Joule |
|
|
Eg |
Energy bandgap of a semiconductor |
Joule |
|
|
Ei |
Intrinsic Fermi energy |
Joule |
|
|
En |
nth quantized energy |
Joule |
|
|
Eph |
Photon energy |
Joule |
|
|
Et |
Trap energy |
Joule |
|
|
Ev |
Valence band energy of a semiconductor |
Joule |
|
|
Evacuum |
Electron energy in vacumm |
Joule |
|
|
F(E) |
Distribution function (probability density function) |
||
|
fBE(E) |
Bose-Einstein distribution function |
||
|
fFD(E) |
Fermi-Dirac distribution function |
||
|
fMB(E) |
Maxwell-Boltzmann distribution function |
||
|
F |
Force |
Newton |
|
|
Fn |
Quasi-Fermi energy of electrons |
Joule |
|
|
Fp |
Quasi-Fermi energy of holes |
Joule |
|
|
gE) |
Density of states per unit energy and per unit volume |
m-3J-1 |
|
|
g(E) |
Density of states in the conduction band per unit energy and per unit volume |
m-3J-1 |
|
|
g(E) |
Density of states in the valence band per unit energy and per unit volume |
m-3J-1 |
|
|
gd |
Output conductance of a MOSFET |
S |
|
|
gm |
Transconductance of a MOSFET |
S |
|
|
G |
Carrier generation rate |
m-3s-1 |
|
|
Gn |
Electron generation rate |
m-3s-1 |
|
|
Gp |
Hole generation rate |
m-3s-1 |
|
|
h |
Plank's constant |
Js |
|
|
|
Reduced Plank's (= h /2p) |
Js |
|
|
I |
Current |
A |
|
|
IB |
Base current of a bipolar transistor |
A |
|
|
IC |
Collector current of a bipolar transistor |
A |
|
|
ID |
Drain current of a MOSFET |
A |
|
|
IE |
Emitter current of a bipolar transistor |
A |
|
|
IF |
Forward active current of a bipolar transistor |
A |
|
|
ID,sat |
Drain current of a MOSFET in saturation |
A |
|
|
Iph |
Photo current |
A |
|
|
Ir |
Recombination current |
A |
|
|
IR |
Reverse active current of a bipolar transistor |
A |
|
|
Is |
Saturation current |
A |
|
|
Isc |
Short circuit current of a solar cell |
A |
|
|
J |
Current density |
A/m2 |
|
|
Jn |
Electron current density |
A/m2 |
|
|
Jp |
Hole current density |
A/m2 |
|
|
k |
Boltzmann's constant |
J/K |
|
|
l |
Mean free path |
m |
|
|
L |
Length |
m |
|
|
LD |
Debye length |
m |
|
|
Ln |
Electron diffusion length |
m |
|
|
Lp |
Hole diffusion length |
m |
|
|
Lx |
Hole diffusion length |
m |
|
|
m |
Mass |
kg |
|
|
m* |
Effective mass |
kg |
|
|
mA |
Atomic mass |
kg |
|
|
m0 |
Free electron mass |
kg |
|
|
me* |
Effective mass of electrons |
kg |
|
|
mh* |
Effective mass of holes |
kg |
|
|
M |
Proton mass |
kg |
|
|
n |
Electron density |
m-3 |
|
|
ni |
Intrinsic carrier density |
m-3 |
|
|
n(E) |
Electron density per unit energy and per unit volume |
m-3 |
|
|
n0 |
Electron density in thermal equilibrium |
m-3 |
|
|
ni |
Intrinsic carrier density |
m-3 |
|
|
nn |
Electron density in an n-type semiconductor |
m-3 |
|
|
nn0 |
Thermal equilibrium electron density in an n-type semiconductor |
m-3 |
|
|
np |
Electron density in a p-type semiconductor |
m-3 |
|
|
np0 |
Thermal equilibrium electron density in a p-type semiconductor |
m-3 |
|
|
N |
Number of particles |
||
|
Na |
Acceptor doping density |
m-3 |
|
|
Na- |
Ionized acceptor density |
m-3 |
|
|
NA |
Avogadro's number |
||
|
NB |
Base doping density |
m-3 |
|
|
Nc |
Effective density of states in the conduction band |
m-3 |
|
|
NC |
Collector doping density |
m-3 |
|
|
Nd |
Donor doping density |
m-3 |
|
|
Nd+ |
Ionized donor density |
m-3 |
|
|
NE |
Emitter doping density |
m-3 |
|
|
Nss |
Surface state density |
m-2 |
|
|
Nt |
Recombination trap density |
m-2 |
|
|
Nv |
Effective density of states in the valence band |
m-3 |
|
|
p |
Hole density |
m-3 |
|
|
p(E) |
Hole density per unit energy |
m-3 |
|
|
p0 |
Hole density in thermal equilibrium |
m-3 |
|
|
pn |
Hole density in an n-type semiconductor |
m-3 |
|
|
pn0 |
Thermal equilibrium hole density in an n-type semiconductor |
m-3 |
|
|
pp |
Hole density in a p-type semiconductor |
m-3 |
|
|
pp0 |
Thermal equilibrium hole density in a p-type semiconductor |
m-3 |
|
|
q |
electronic charge |
C |
|
|
Q |
Heat |
Joule |
|
|
QB |
Majority carrier charge density in the base |
C/m2 |
|
|
Qd |
Charge density per unit area in the depletion layer of an MOS structure |
C/m2 |
|
|
Qd,T |
Charge density per unit area at threshold in the depletion layer of an MOS structure |
C/m2 |
|
|
Qi |
Interface charge density per unit area |
C/m2 |
|
|
Qinv |
Inversion layer charge density per unit area |
C/m2 |
|
|
QM |
Charge density per unit area in a metal |
C/m2 |
|
|
Qn |
Charge density per unit area in the depletion layer of an n-type region |
C/m2 |
|
|
Qp |
Charge density per unit area in the depletion layer of a p-type region |
C/m2 |
|
|
Qss |
Surface state charge density per unit area |
C/m2 |
|
|
re |
Emitter resistance |
Ohm |
|
|
rp |
Base resistance |
Ohm |
|
|
R |
The Rydberg constant |
J |
|
|
Rn |
Electron recombination rate |
m-3s-1 |
|
|
Rp |
Hole recombination rate |
m-3s-1 |
|
|
Rs |
Sheet resistance |
Ohm |
|
|
s |
Spin |
||
|
S |
Entropy |
J/K |
|
|
t |
Thickness |
m |
|
|
tox |
Oxide thickness |
m |
|
|
T |
Temperature |
Kelvin |
|
|
uw |
Spectral density |
Jm-3s-1 |
|
|
U |
Total energy |
Joule |
|
|
UA |
Auger recombination rate |
m-3s-1 |
|
|
Ub-b |
Band-to-band recombination rate |
m-3s-1 |
|
|
Un |
Net recombination rate of electrons |
m-3s-1 |
|
|
Up |
Net recombination rate of holes |
m-3s-1 |
|
|
USHR |
Shockley-Read-Hall recombination rate |
m-3s-1 |
|
|
v |
Velocity |
m/s |
|
|
vR |
Richardson velocity |
m/s |
|
|
vsat |
Saturation velocity |
m/s |
|
|
vth |
Thermal velocity |
m/s |
|
|
V |
Potential energy |
Joule |
|
|
Va |
Applied voltage |
V |
|
|
VA |
Early voltage |
V |
|
|
Vbr |
Breakdown voltage |
V |
|
|
VB |
Base voltage |
V |
|
|
VBE |
Base-emitter voltage |
V |
|
|
VBC |
Base-collector voltage |
V |
|
|
VC |
Collector voltage |
V |
|
|
VCE |
Collector-emitter voltage |
V |
|
|
VD |
Drain voltage |
V |
|
|
VDS |
Drain-source voltage |
V |
|
|
VDS,sat |
Drain-source saturation voltage |
V |
|
|
VE |
Emitter voltage |
V |
|
|
VFB |
Flatband voltage |
V |
|
|
VG |
Gate voltage |
V |
|
|
VGS |
Gate-source voltage |
V |
|
|
Voc |
Open circuit voltage of a solar cell |
V |
|
|
Vt |
Thermal voltage |
V |
|
|
VT |
Threshold voltage of an MOS structure |
V |
|
|
w |
Depletion layer width |
m |
|
|
wB |
Base width |
m |
|
|
wC |
Collector width |
m |
|
|
wE |
Emitter width |
m |
|
|
wn |
Width of an n-type region |
m |
|
|
wp |
Width of a p-type region |
m |
|
|
W |
Work |
Joule |
|
|
x |
Position |
m |
|
|
xd |
Depletion layer width in an MOS structure |
m |
|
|
xd,T |
Depletion layer width in an MOS structure at threshold |
m |
|
|
xj |
Junction depth |
m |
|
|
xn |
Depletion layer width in an n-type semiconductor |
m |
|
|
xp |
Depletion layer width in a p-type semiconductor |
m |
|
|
α |
Absorption coefficient |
m-1 |
|
|
αF |
Forward active transport factor |
||
|
αn |
Ionization rate coefficient for electrons |
m-1 |
|
|
αR |
Reverse active transport factor |
||
|
αT |
Base transport factor |
||
|
β |
Current gain |
||
|
γ |
Body effect parameter |
V1/2 |
|
|
γE |
Emitter efficiency |
||
|
γn |
Auger coefficient for electrons |
m6s-1 |
|
|
γp |
Auger coefficient for holes |
m6s-1 |
|
|
δ n |
Excess electron density |
m-3 |
|
|
δ p |
Excess hole density |
m-3 |
|
|
δ R |
Depletion layer recombination factor |
||
|
ΔQn,B |
Excess electron charge density in the base |
C/m2 |
|
|
ε |
Dielectric constant |
F/m |
|
|
ε0 |
Permittivity of vacuum |
F/m |
|
|
εox |
Dielectric constant of the oxide |
F/m |
|
|
εs |
Dielectric constant of the semiconductor |
F/m |
|
|
ε0 |
Permeability of vacuum |
H/m |
|
|
Θ |
Tunnel probability |
||
|
μ |
Wavelength |
m |
|
|
μ |
Electro-chemical potential |
Joule |
|
|
μn |
Electron mobility |
m2/V-s |
|
|
μp |
Hole mobility |
m2/V-s |
|
|
ν |
Frequency |
Hz |
|
|
ρ |
Charge density per unit volume |
C/m3 |
|
|
ρox |
Charge density per unit volume in the oxide |
C/m3 |
|
|
σ |
Conductivity |
Ω-1m-1 |
|
|
τ |
Scattering time |
s |
|
|
τn |
Electron lifetime |
s |
|
|
τp |
Hole lifetime |
s |
|
|
φ |
Potential |
V |
|
|
φB |
Barrier height |
V |
|
|
φF |
Bulk potential |
V |
|
|
φi |
Built-in potential of a p-n diode or Schottky diode |
V |
|
|
φs |
Potential at the semiconductor surface |
V |
|
|
Φ |
Flux |
m-2s-1 |
|
|
ΦM |
Workfunction of the metal |
V |
|
|
ΦMS |
Workfunction difference between the metal and the semiconductor |
V |
|
|
ΦS |
Workfunction of the semiconductor |
V |
|
|
χ |
Electron affinity of the semiconductor |
V |
|
|
Ψ |
Wavefunction |
||
|
ω |
Radial frequency |
rad/s |